Source Availability
A production fab needs light that is stable, diagnosable, and serviceable across long operating windows, not just high peak performance in isolation.
Advanced Manufacturing Infrastructure
We are building the next generation semiconductor fab.
EnergeticFlux is developing a facility-scale FEL light-source architecture for semiconductor fabs: injector, superconducting linac, undulator, EUV/BEUV optics, ten scanner feeds, and spent-beam recovery.
10
scanner feed architecture
FEL
high-brightness source path
ERL
energy recovery strategy
EUV / BEUV
lithography light delivery
Why This Matters
Lithography capacity depends on the light-source infrastructure behind the scanner.
Advanced semiconductor manufacturing is constrained by source power, uptime, optical delivery, tool integration, and the ability to scale reliably across many exposure lines. EnergeticFlux is approaching the problem as a complete facility architecture, not as a single isolated device.
Multi-Tool Distribution
The optical distribution path routes EUV/BEUV photons through a controlled manifold so one source complex can support multiple scanner feeds.
Factory Integration
The source, optics, controls, metrology, shielding, maintenance access, and scanner interfaces have to be designed together from the start.
System Architecture
A facility-scale FEL source for high-volume semiconductor exposure.
The platform brings accelerator physics, EUV optics, vacuum engineering, scanner delivery, and factory controls into one coordinated source system.
Injector and superconducting linac
Electron bunches are generated, conditioned, and accelerated through RF superconducting cavities, with diagnostics and beam-quality control along the accelerating path.
Tapered FEL radiator
A precision undulator section converts the electron bunch train into coherent EUV/BEUV radiation, while the spent electron beam is separated for recovery and safe termination.
Optics and scanner feeds
Grazing-incidence mirrors, shutters, metrology, and gated branches shape and distribute photons into multiple scanner exposure columns and wafer stages.
Controls, safety, and serviceability
The facility model includes vacuum, cryogenics, RF power, alignment, interlocks, beam dumps, shielding, maintenance zones, and operations telemetry.
Engineering Program
From source physics to fab integration, the program is built in linked stages.
EnergeticFlux is developing the source-to-scanner chain through integrated modeling, subsystem specifications, and partner validation across the accelerator, optics, and manufacturing interfaces.
Integrated physics model
Coupled accelerator, FEL, optics, thermal, vibration, and scanner-feed models define the operating envelope for the source platform.
Subsystem requirements
Requirements flow into cavities, RF, cryogenics, undulators, mirror trains, metrology, controls, shielding, and fab interfaces.
Industrial collaboration
Semiconductor, optics, accelerator, and manufacturing partners help test design assumptions against real operating constraints.
Who We Work With
Partnerships across the lithography source chain.
Semiconductor manufacturers
Fab operators evaluating advanced lithography source capacity and tool integration pathways.
Accelerator and RF teams
Groups with expertise in injectors, SRF cavities, ERLs, undulators, beam diagnostics, and controls.
Optics and metrology groups
Partners focused on EUV/BEUV mirror trains, dose stability, alignment, contamination control, and wafer-plane delivery.
Capital and strategic partners
Organizations aligned with long-horizon semiconductor infrastructure and deep engineering programs.
Operating Philosophy
Designed around source stability, optical control, and service access.
A fab light source has to be more than bright. It has to hold dose, preserve beam quality, expose through controlled scanner feeds, and remain maintainable inside a production facility.
Stable photon delivery
Controlled optical manifold
Energy-aware beam handling
Serviceable facility layout
Contact
Discuss source architecture, subsystem collaboration, or industrial partnership.
Connect with EnergeticFlux on lithography source infrastructure, accelerator systems, EUV optics, semiconductor manufacturing, and long-horizon industrial programs.
umeshcs@energeticflux.comAbout Us
EnergeticFlux is being built around deep technical execution.
The company is focused on advanced semiconductor infrastructure where accelerator systems, lithography-source physics, controls, optics, and manufacturing integration are being designed as one working platform.
Founder Chairman
Umesh Chandra Surepalli holds a B.Tech in Electrical Engineering from IIT Madras. He was the code-reviewer of the RTOS of Global-7500 Aircraft, a quantum blockchain and cryptocurrency consultant and the designer of e-₹upE, and also a Quantum Cybersecurity Technical & Business consultant.